resarПриродные ресурсы Арктики и СубарктикиArctic and Subarctic Natural Resources2618-97122686-9683Академия наук Республики Саха (Якутия)10.31242/2618-9712-2023-28-3-487-494resar-243Research ArticleМатериаловедение и химические технологииMaterials science and chemical technologiesНаноструктурированные углеродные пленки, полученные методом осаждения в плазме СН4 с последующей термообработкой: структурные особенности, их влияние на электрические и оптоэлектронные свойстваNanostructured carbon films obtained by CH4 plasma deposition and annealing at high temperature: structural features and their effects on electrical and optoelectronic propertieshttps://orcid.org/0000-0002-2212-2485ПрокопьевА. Р.ProkopevA. R.

ПрокопьеВ Айсен Русланович, научный сотрудник

Якутск

Scopus AuthorID: 1127739,

ResearcherID: GPP-2928-2022

Prokopev, Aisen R., Researcher

Yakutsk

Scopus AuthorID: 1127739,

ResearcherID: GPP-2928-2022

aisenprokopiev@mail.ruhttps://orcid.org/0000-0002-8163-2012НеустроевЕ. П.NeustroevE. P.

Неустроев Ефим Петрович, кандидат физико-математических наук, доцент

Якутск

Scopus AuthorID: 32482,

ResearcherID: A-3860-2014

Neustroev, Efim P., Cand. Sci. (Phys. and Math.), Associate Professor

Yakutsk

Scopus AuthorID: 32482,

ResearcherID: A-3860-2014

neustr@mail.ruСеверо-Восточный федеральный университет им. М.К. АммосоваРоссияAmmosov North-Eastern Federal UniversityRussian Federation202326092023283487494Copyright © Прокопьев А.Р., Неустроев Е.П., 20232023Прокопьев А.Р., Неустроев Е.П.Prokopev A.R., Neustroev E.P.Данная работа распространяется под лицензией Creative Commons Attribution 4.0.This work is licensed under a Creative Commons Attribution 4.0 License.https://resar.elpub.ru/jour/article/view/243

В работе представлены результаты исследования структуры, электрических и оптоэлектронных свойств наноструктурированных углеродных пленок, полученных методом осаждения в плазме метана с последующей термообработкой. Показано, что условия получения пленок влияют на конечные физико-химические параметры. Изучение морфологии пленок проведено методами атомно-силовой микроскопии, сканирующей электронной микроскопии, рамановской и рентгеновской энергодисперсионной спектроскопии, анализа вольтамперных характеристик (ВАХ). Толщины пленок составляют от 20 до 150 нм с отношением содержания атомов углерода к атомам кислорода (C/O) 4:1. Исследования структуры показали, что полученные пленки состоят из нанографитовых чешуек, латеральные размеры которых лежат в диапазоне от 5 до 12 нм с различным соотношением sp3/sp2 кристаллических фаз углерода. Установлено, что с увеличением температуры постплазменной термообработки от 650 до 800 °С повышается дефектность структуры углеродных пленок. В то же время растет степень графитизации, на что указывают данные рамановской спектроскопии и значения слоевых сопротивлений, определенные из ВАХ. Из температурных зависимостей ВАХ были вычислены значения фототоков, показавшие, что образцы проявляют фоточувствительность в диапазоне температур от комнатной температуры до –173 °С. Данные результаты могут быть полезны при создании сенсоров дневного и ночного освещения, а также датчиков температуры, пригодных для использования в широком интервале температур.

This article is dedicated to the study of the structural, electrical, and optoelectronic properties of nanostructured carbon films obtained by methane plasma deposition, followed by annealing at high temperatures (650–800 °C). The conditions for obtaining the films affected the final physicochemical parameters. We studied the film morphology using atomic force microscopy, scanning electron microscopy, Raman spectroscopy, X-ray energy-dispersive analysis, and analysis of the current voltage (C-V) characteristics. The film thickness ranged from 20 to 150 nm, with a C/O ratio of 4:1. Structural studies have shown that the resulting nanostructured carbon films consist mainly of nanographite flakes, the lateral dimensions of which lie in the lateral size (La) range of 5 to 12 nm, and contain different fractional concentrations of sp3/sp2 crystalline phases of carbon. We have established that with an increase in the annealing temperature, the defectiveness of the carbon film structure increases; however, at the same time, the degree of graphitization increases, as indicated by the Raman spectroscopy data and the calculated values of layer resistances from the C-V characteristics. The values of photocurrents were calculated, from which it was found that the samples exhibited photosensitivity in the temperature range of room temperature to –173 °C, based on the temperature dependences of the C-V. The obtained results can be useful in creating day and night light sensors as well as temperature sensors suitable for use at low temperatures.

наноструктурированная углеродная пленкаосаждение углерода в плазметермообработкаsp2-нанокристаллиты графитатемпературная зависимость ВАХфототокнизкие температурыnanostructured carbon filmscarbon deposition in plasmaannealingsp2-nanocrystalline graphitetemperature dependencies of C-Vphotocurrentlow temperaturesРабота выполнена в рамках проекта Министерства науки и высшего образования Российской Федерации (№ FSRG-2022-0011) и гранта Главы РС(Я) для молодых ученых, специалистов и студентов «Получение углеродсодержащих пленочных покрытий, осажденных на различные поверхности в плазме метана»This study was funded by the Ministry of Science and Higher Education (number FSRG-2022-001) and a grant from the Head of the Republic of Sakha (Yakutia) for young scientists, specialists and students “Production of carbon-containing film coatings deposited on various surfaces in methane plasma”ReferencesZeng Y. et al. 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The authors declare that there are no conflicts of interest present.